Nanofabrication


  • 350 sq. ft. class 100 clean room
  • 1200 sq. ft. class 10,000 clean room
  • 10 KeV four pocket e-beam deposition system with planetary and residual gas monitoring
  • 3 sputtering systems, all cryopumped
  • 2 Marsh Reactive Ion Etchers ( one for Cl with gas cabinet , monitor and scrubbers)
  • Habraline 500 contact mask aligner
  • Atomic force microscope
  • Ellipsometer
  • 3 and 6” tube furnaces
  • Photoresist spinner and dryers (2)
  • Critical point dryer
  • JEOL 7000 F SEM with e-beam Nanolithography facility (20 nm feature)
  • OAI Model 800 Mask Aligner with NLS nanoimprinting module
  • NLS AR-STA-100 Nanoimprint sample treatment system
  • CVD furnace for CNT
  • Micro Probe System
  • Magnetron Sputter
  • Multi-mode AFM/MFM/STM Probe System
  • HO Magnetometer
  • Measurement Spin-Stand

© FIU AMERI 2016